Field Emission Scanning Electron Microscope (FESEM)

Make&Model: CARL ZEISS UHR FESEM MODEL GEMINI SEM 500 KMAT
Specification:
Source: Schottky field emitter
Probe Current: 3pA to 100nA
Resolution: 0.8 nm
Max. weight of the sample: 0.5 kg
Magnification: 50X to 2000000X
Mode: Only high vacuum (HV)
Accessories available: EDAX, BSE
Applications: Surface morphology, Elemental analysis, Particle size distribution
Sample: Solid, Powder, Dry biological samples.
FESEM Requisition form (External): Download

Sputter Coater

Make&Model: Quoram Sputter Coater Q150R S Plus
Specification:
Sputter coaters are used to deposit a thin metal layer on the surface of a sample/substrate for SEM and EDS applications.
Sputtering: 0–80 mA to a pre-determined thickness (with optional FTM) or by the built-in timer
Film Thickness: Electrically conductive, with a thickness of 3 - 20 nm
The sputtering time: Maximum 60 minutes (without breaking vacuum and with built in cooling periods)
Specimen stage: 50 mm Ø rotation stage
Rotation speed: 8-20 RPM
Typical ultimate vacuum: ∼2x10-2 mbar in a clean system after pre-pumping with dry nitrogen gas
Sample: Solid, Powder, Dry biological samples.
Sputter Coater Requisition form (External): Download

Powder X-Ray Diffraction (PXRD)

Make & Model: Bruker D8 Advance A25
Specification:
X-Ray Source: 2.2 kW Cu anode long fine focus ceramic X-ray tube
Running condition power supply: 40 kV and 40 mA
  • Max. sample weight, depending on sample holder: 250 g
  • Max. sample height, depending on sample holder: 25 mm
  • Max. sample diameter: 70 mm
Applications:
  • Phase Composition of a Sample
    • Quantitative Phase Analysis: determine the relative amounts of phases in a mixture by referencing the relative peak intensities.
  • Unit cell lattice parameters and Bravais lattice symmetry
    • Index peak positions
    • Lattice parameters can vary as a function of, and therefore give you information about, alloying, doping, solid solutions, strains, etc.
  • Residual Strain (macrostrain)
  • Crystal Structure
    • By Rietveld refinement of the entire diffraction pattern
  • Epitaxy/Texture/Orientation
  • Variable temperature analysis
  • Capillary measurements
  • Crystallite Size and Micro strain
    • Indicated by peak broadening.
    • Other defects (stacking faults, etc.) can be measured by analysis of peak shapes and peak width.
  • Sample: Solid, Thin films and powder
    PXRD Requisition form (External): Download

Atomic Force Microscope (AFM)

Make&Model: Bruker, Dimension Icon
Specification:
• Sample Size: 210mm vacuum chuck for samples, ≤ 210mm diameter, ≤15mm thick
• X-Y Position Noise: ≤0.15nm RMS typical imaging bandwidth (up to 625Hz)
• Z Sensor Noise Level: 35pm RMS typical imaging bandwidth (up to 625Hz)
• X-Y Imaging Area: 90µm x 90µm typical
• Z range: 10µm typical in imaging and force curve modes
Applications:
• Identification of surface topography.
• Identification of nature of interaction between specific atom and its neighbouring.
• Electric properties can be measured by using conducting probes.
• Work function measurement using KPFM.
• Atomic level manipulations can also be done.
Sample:
AFM Requisition form (External): Download

Electro polishing machine

Make&Model: Struers LectroPol-5
Applications: Electropolishing is an efficient materialographic technique for materials investigation in high resolution microscopy, where any mechanical artifacts from sample preparation are unacceptable. This eliminates the surface deformation.
Sample: Solid
Electro polishing machine Requisition form (External): Download

Ultra-High-Performance Liquid Chromatography with High-Resolution Mass Spectrometer (UHPLC-HRMS)

Make&Model: Agilent 6545XT AdvanceBio LC/Q-TOF
Applications:
Sample: Solid and Liquid
UHPLC-HRMS Job Requisition Form (External):Download

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